Our production-proven CMP equipment is ideal for a broad range applications including oxide, silicon oxide, silicon nitride, tungsten, polysilicon, SOI, AlTiC, SiC, quartz, glass, aluminum nitride, gallium arsenide-based devices, lithium niobate and lithium tantalite-based devices, and other thin films. With over twenty years of CMP process experience, our applications engineers are ready to assist you in developing a process that achieves your requirements.
Our production proven CMP equipment is ideal for oxide, tungsten, polysilicon, SOI, and other thin film applications.
Our grinders are used for a broad range of compound materials, including: silicon carbide, silicon, gallium arsenide, germanium, and indium phosphide.
Our promise to you is to always provide the highest-quality equipment available, and that includes our re-manufactured equipment.