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R&D CMP and Wafer Grinding
Wafer Reclaim
Whole Wafer Sample Preparation
 
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Taipei World Trade Center
Taipei, Taiwan
Sept 8-10, 2010
Booth 319, CMP Pavilion
 
Wafer Reclaim

Strasbaugh is the Leading Supplier of CMP Equipment to the US Data Storage Industry
Introduction
Strasbaugh’s Wafer Reclaim equipment is designed for high reliability, superior process performance and low cost of ownership. Our affordable CMP and grinding systems are fully automated and equipped with state-of-the-art technologies and can handle virtually any material encountered in Wafer Reclaim.
 
Strasbaugh offers the STB P300 and nTegrity CMP systems and the nTellect wafer grinder for Wafer Reclaim.
 
Key CMP Technologies
  • Advanced wafer carriers improve uniformity and reduce edge exclusion
  • Multi-zone back pressure further improves within-wafer uniformity and center-to-edge process performance
  • Defectivity controls reduce contamination and increase yield

Key Grinding Technologies

  • Force Adaptive, In-feed wafer grinding technology limits grind force, protecting fragile substrates, while optimizing throuhgput 
  • In-situ thickness measurement improves TTV and ensures wafer-to-wafer consistency
Applications
  • Tungsten
  • Oxide
  • STI
  • Copper
  • Silicon
  • Compound Semiconductor
Wafer Sizes
  • 75mm to 300mm
  • Notched, flatted, and round wafers accommodated
Products

     
 
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