CMP for Failure Analysis, MEMS, Telecommunications and R&D

Strasbaugh's nSpireTM CMP system (model 6EC) is an economical tool for CMP research, MEMS polishing, telecommuncitions, WholeWaferDeconstructTM for failure analysis, and low-volume production. Its semi-automatic operations are programmable through a color, touch-screen GUI for repeatable and accurate process control. Featuring advanced technologies, nSpire's ViPRRTM Carrier and Hydro-Lift Load StationTM minimize contamination and deliver superior, center-to-edge uniformity. The nSpire uses the same process control methods, wafer carrier, load station, and pad conditioner as Strasbaugh's fully-automated nTegrity® (model 6DS-SP) CMP system, easing the transition from development to production. nSpire is the affordable solution, providing the benefits of state-of-the-art CMP at a low cost. nSpire Benefits Operations are programmable through a color, touchscreen GUI Process recipes are transfer-able to Strasbaugh's fully automated nTegrity CMP system for high-volume production ViPRR carriers reduce edge exclusion, control center-to- edge uniformity, and improve overall performance and reliability Hydro-Lift Load Station and spindle flush eliminate front- side contact and reduce contamination Closed-loop table and spindle RPM motors help ensure consistent process results Programmable pad conditioning increases the lifetime of the pad and improves WIWNU Minimal maintenance lowers the cost of ownership Small footprint makes nSpire convenient for small labs Pad conditioning system provides in-situ and/or ex-situ programmable selective pad conditioning for consistent removal rates and minimum non-uniformity. 20 zones of programmable control: dwell time, downforce and RPM can be programmed for each zone. Pad conditioning can be done with a diamond plated disk or nylon brush. To request more information on Strasbaugh's nSpire CMP, click here.